Nova and Samsung Win Vladimir Ukraintsev Award for Metrology Collaboration
Rehovot, Israel, March 18, 2025
Nova (NASDAQ: NVMI), a leading innovator and global supplier of metrology solutions for advanced process control in semiconductor manufacturing, is proud to announce that its co-authored paper with Samsung Electronics has been recognized with the prestigious Vladimir Ukraintsev Award at the 2024 Advanced Lithography + Patterning Conference (ALP) held by the International Society for Optics and Photonics (SPIE).
The Collaborative Paper
The winning paper, titled “On-Cell Thickness Monitoring of Chalcogenide Alloy Layer using Spectral Interferometry, Raman Spectroscopy, and Hybrid Machine Learning,” was authored by a team of researchers from both Nova and Samsung Electronics. The collaboration focused on the development of advanced metrology techniques for monitoring chalcogenide alloy layers in semiconductor manufacturing, which are essential for the production of state-of-the-art devices.
Impact on the Semiconductor Industry
The achievement of this award-winning collaboration signifies a significant milestone in the semiconductor industry. By combining Nova’s expertise in metrology and Samsung’s knowledge of semiconductor manufacturing, the partnership has led to the development of a more accurate and efficient method for monitoring chalcogenide alloy layers using spectral interferometry, Raman spectroscopy, and hybrid machine learning algorithms. This novel approach is expected to improve the overall yield and quality of semiconductor devices, resulting in increased performance and reduced manufacturing costs.
Implications for Consumers
For consumers, this collaboration could lead to the production of more advanced and efficient semiconductor devices. As a result, consumers may experience faster and more powerful computers, improved Internet of Things (IoT) devices, and enhanced performance in various electronic applications. Moreover, the cost savings from increased manufacturing efficiency could lead to more affordable consumer electronics.
Impact on the Research Community
The Vladimir Ukraintsev Award for Collaborations in Metrology is a testament to the importance of interdisciplinary research in advancing technology. This award-winning collaboration between Nova and Samsung Electronics sets a precedent for future collaborations in the field of metrology and semiconductor manufacturing. The research community is encouraged to continue exploring innovative techniques and pushing the boundaries of technology to solve complex challenges and drive progress.
Conclusion
The collaboration between Nova and Samsung Electronics, as recognized by the Vladimir Ukraintsev Award for Collaborations in Metrology, showcases the power of interdisciplinary research in driving innovation and advancing technology. Their groundbreaking work on on-cell thickness monitoring of chalcogenide alloy layers using spectral interferometry, Raman spectroscopy, and hybrid machine learning algorithms is expected to revolutionize the semiconductor industry, leading to improved device performance, reduced manufacturing costs, and enhanced consumer experiences. As the field continues to evolve, it is essential for researchers and industry leaders to collaborate and explore new frontiers in metrology and technology.
- Nova and Samsung win prestigious Vladimir Ukraintsev Award for metrology collaboration
- Collaboration focused on developing advanced metrology techniques for monitoring chalcogenide alloy layers
- New method uses spectral interferometry, Raman spectroscopy, and hybrid machine learning algorithms
- Expected to improve semiconductor device yield and quality, reduce manufacturing costs
- Implications for consumers: More advanced, efficient devices, increased performance, and affordable electronics
- Impact on research community: Encourages interdisciplinary research and innovation
